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Positron-Induced Ion-Desorption from the Oxidized Ni Surface

Terashima, Y. Ozaki, A. Arai, R. Kanazawa, I. Ito, Y. Fukutani, K. Murata, Y. Komori, F.; Sperr, P.

Materials science forum.; Positron annihilation; Munich, Germany, 2000; Aug, 2001, 526-528 -- Trans Tech Publications; 2001 (pages 526-528) -- 2001

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The Estimation of the Vacancy-Type Defects Density in Thin Fe Film with Slow Positron Beam

Nagata, T. Terashima, Y. Takagi, K. Kawai, T. Kanazawa, I. Suzuki, R. Ohdaira, T. Komori, F. Ito, Y.; Sperr, P.

Materials science forum.; Positron annihilation; Munich, Germany, 2000; Aug, 2001, 490-492 -- Trans Tech Publications; 2001 (pages 490-492) -- 2001

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Comparison of Nanosized Pattern of Calixarene and ZEP520 Resist by Using Energy Deposition Distribution

Zhang, H. et al.

Key engineering materials. VOL 534, ; 2013, 107-112 -- TRANS TECH PUBLICATIONS Part; (pages 107-112) -- 2013

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Fabrication of CoPt Nanodot Array with a Pitch of 33 nm Using Pattern-Transfer Technique of PS-PDMS Self-Assembly

Huda, M. et al.

Key engineering materials. VOL 596, ; 2014, 83-87 -- TRANS TECH PUBLICATIONS Part; (pages 83-87) -- 2014

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Adsorbed Hydrogen Effect of Reemitted Slow Positrons from Ni Surface

Wada, T. et al.

Materials science forum.; Positron annihilation; ICPA 13; Kyoto, Japan, 2003 Sep, 2004, 413-415 -- Trans Tech Publications; 2004 (pages 413-415) -- 2004

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Fabrication of 30-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Lithography and Ion Milling for Patterned Media

Mohamad, Z. et al.

Key engineering materials. VOL 534, ; 2013, 118-121 -- TRANS TECH PUBLICATIONS Part; (pages 118-121) -- 2013

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Fabrication of 6-nm-Sized Nanodot Arrays with 12 nm-Pitch along Guide Lines Using both Self-Assembling and Electron Beam-Drawing for 5 Tbit/in^2 Magnetic Recording

Hosaka, S. et al.

Key engineering materials. VOL 596, ; 2014, 73-77 -- TRANS TECH PUBLICATIONS Part; (pages 73-77) -- 2014

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Improved Observation Contrast of Block-Copolymer Nanodot Pattern Using Carbon Hard Mask (CHM)

Akahane, T. et al.

Key engineering materials. VOL 534, ; 2013, 126-130 -- TRANS TECH PUBLICATIONS Part; (pages 126-130) -- 2013

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Estimation of HSQ Resist Profile by Using High Contrast Developement Model for High Resolution EB Lithography

Zhang, H. et al.

Key engineering materials. VOL 596, ; 2014, 97-100 -- TRANS TECH PUBLICATIONS Part; (pages 97-100) -- 2014

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Effect of Salty Development on Forming HSQ Resist Nanodot Arrays with a Pitch of 15x15 nm^2 by 30-keV Electron Beam Lithography

Komori, T. et al.

Key engineering materials. VOL 534, ; 2013, 113-117 -- TRANS TECH PUBLICATIONS Part; (pages 113-117) -- 2013

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Results 1 - 10 of 19  for Everything in this catalogue

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  1. Komori, T.  (10)
  2. Hosaka, S.  (9)
  3. Yin, Y  (9)
  4. Zhang, H.  (6)
  5. Huda, M.  (5)
  6. Akahane, T.  (5)
  7. Mohamad, Z.b.  (5)
  8. Sperr, P.  (3)
  9. Komori, M.  (3)
  10. Liu, J.  (3)
  11. Mohamad, Z.  (3)
  12. Sekiguchi, R.  (2)
  13. Gao, Y  (2)
  14. Liu, W. D.  (2)
  15. Takaya, Y.  (2)
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  1. Komori, T.
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